Rob van Ballegoij

The future of EUV lithography: enabling Moore's Law in the next decade

Alberto Pirati, Jan van Schoot, Kars Troost et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 62 citations

Engineering, Electrical Engineering, Optics +12

Next step in Moore’s law: high NA EUV system overview and first imaging and overlay performance

Jan van Schoot, Rob van Ballegoij, Hans Butler et al. · Journal of Micro/Nanopatterning Materials and Metrology · 2024 · 23 citations

Natural Sciences, Computer Systems, Electronic Materials +12

High-NA EUV lithography enabling Moore’s law in the next decade

Jan van Schoot, Kars Troost, Frank Bornebroek et al. · 2017 · 20 citations

Natural Sciences, Computer Systems, Digital Imaging +12

Extending 1.35 NA immersion lithography down to 1x nm production nodes

Igor Bouchoms, Martijn Leenders, Jan Jaap Kuit et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 16 citations

Engineering, Manufacturing Engineering, Materials Science +9

High-NA EUV lithography exposure tool progress

Jan van Schoot, Eelco van Setten, Kars Troost et al. · 2019 · 16 citations

Natural Sciences, Biomedical Engineering, Digital Imaging +8