Vincent Farys

$1.62\mu \mathrm{m}$ Global Shutter Quantum Dot Image Sensor Optimized for Near and Shortwave Infrared

Jonathan S. Steckel, E. Josse, Andras G. Pattantyus‐Abraham et al. · 2021 IEEE International Electron Devices Meeting (IEDM) · 2021 · 47 citations

Optical Materials, Quantum Photonics, Shortwave Infrared +30

Measurement of residual thickness using scatterometry

D. Fuard, Corinne Perret, Vincent Farys et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2005 · 26 citations · Full text

Engineering, Electron-beam Lithography, Measurement +23

Template affinity role in CH shrink by DSA planarization

Raluca Tiron, A. Gharbi, Patricia Pimenta‐Barros et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 18 citations

Engineering, Electron-beam Lithography, Structural Bioinformatics +25

Advanced OPC Mask-3D and Resist-3D modeling

A. Szücs, Jonathan Planchot, Vincent Farys et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 16 citations

Engineering, Electron-beam Lithography, Exposure Dose +24

The measurement uncertainty challenge for the future technological nodes production and development

J. Foucher, P. Faurie, A.-L. Foucher et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 12 citations

Engineering, Measurement, Industrial Engineering +28