C. Demeurisse

P implantation doping of Ge: Diffusion, activation, and recrystallization

A. Satta, Tom Janssens, Trudo Clarysse et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2006 · 96 citations

Engineering, Materials Engineering, Materials Science +15

Work function of Ni silicide phases on HfSiON and SiO/sub 2/: NiSi, Ni/sub 2/Si, Ni/sub 31/Si/sub 12/, and Ni/sub 3/Si fully silicided gates

J. A. Kittl, Małgorzata Pawlak, A. Lauwers et al. · IEEE Electron Device Letters · 2005 · 71 citations

Engineering, Materials Science, Physics +17

Silicides and germanides for nano-CMOS applications

J. A. Kittl, Karl Opsomer, C. Torregiani et al. · Materials Science and Engineering B · 2008 · 66 citations

Engineering, Materials Engineering, Materials Science +12

Silicides for the 100-nm node and beyond: Co-silicide, Co(Ni)-silicide and Ni-silicide

A. Lauwers, M. de Potter, O. Chamirian et al. · Microelectronic Engineering · 2002 · 63 citations

Natural Sciences, Materials Engineering, Materials Science +4

Hybrid 14nm FinFET - Silicon Photonics Technology for Low-Power Tb/s/mm ² Optical I/O

Michał Rakowski, Yuseok Ban, Peter De Heyn et al. · 2018 · 46 citations

Engineering, Electrical Engineering, Microelectronics +16