K. Kragler

Scanning tunneling microscopy based lithography employing amorphous hydrogenated carbon as a high resolution resist mask

K. Kragler, Elena Günther, R. Leuschner et al. · Applied Physics Letters · 1995 · 24 citations

Engineering, Electron-beam Lithography, Microscopy +20

PN and SOI wafer flow process for stencil mask fabrication

Joerg Butschke, Albrecht Ehrmann, E. Haugeneder et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1999 · 13 citations

Materials Science, Wafer Scale Processing, Engineering +14

Low-voltage electron-beam lithography with scanning tunneling microscopy in air: A new method for producing structures with high aspect ratios

K. Kragler, Elena Günther, R. Leuschner et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1996 · 12 citations

Engineering, Electron-beam Lithography, Microscopy +21

Directly sputtered stress-compensated carbon protective layer for silicon stencil masks

P. Hudek, P. Hrkút, Milan Držík et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 12 citations

Materials Engineering, Materials Science, Electrical Engineering +13

Vortex arrays in the BSCCO (2212) single crystals in the vicinity of steps on the sample surface

L. Ya. Vinnikov, Fedor L. Barkov, Bernd Irmer et al. · Physica C Superconductivity · 1998 · 10 citations

Materials Science, Magnetism, Vortex Arrays +13