Emil C. Piscani

Characterization of CD-SEM metrology for iArF photoresist materials

Benjamin Bunday, Aaron Cordes, Ndubuisi G. Orji et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 23 citations

Cd-sem Metrology, Engineering, Electron-beam Lithography +18

Film quantum yields of EUV and ultra-high PAG photoresists

Elsayed Hassanein, Craig Higgins, Patrick Naulleau et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 22 citations

Engineering, Inorganic Photochemistry, Chemistry +18

High index 193 nm immersion lithography: the beginning or the end of the road

Paul Zimmerman, Bryan J. Rice, Emil C. Piscani et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 19 citations

Polysulfone based non-CA resists for 193nm immersion lithography: Effect of increasing polymer absorbance on sensitivity

Lan Chen, Yong-Keng Goh, Kirsten Lawrie et al. · Radiation Physics and Chemistry · 2010 · 16 citations

Materials Science, Non-ca Resists, Engineering +10

Novel high-index resists for 193-nm immersion lithography and beyond

Idriss Blakey, Lan Chen, Bronwin Dargaville et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 15 citations

Optical Materials, Engineering, Electron-beam Lithography +22