Mir Shahrjerdy

Improving full-wafer on-product overlay using computationally designed process-robust and device-like metrology targets

Youngsik Kim, Young-Sun Hwang, Mi-Rim Jung et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 18 citations

Engineering, Manufacturing Engineering, Design Automation +14

Evaluation of a new metrology technique to support the needs of accuracy, precision, speed, and sophistication in near-future lithography

Chih-Ming Ke, Jimmy Hu, Willie Wang et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 17 citations

Engineering, Manufacturing Engineering, Instrumentation +14

The application of SMASH alignment system for 65-55-nm logic devices

Mami Miyasaka, Hideki Saito, Takao Tamura et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 16 citations

Engineering, Computer Engineering, Electrical Engineering +11

Litho process control via optimum metrology sampling while providing cycle time reduction and faster metrology-to-litho turn around time

K.-H. Chen, Jacky Huang, Wencheng Yang et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 11 citations

Engineering, Manufacturing Engineering, Instrumentation +11

Measuring after etch overlay and characterizing tilt fingerprints in multi-tier 3D-NAND structures

Honggoo Lee, Dong-Young Lee, Jun-Yeob Kim et al. · 2019 · 11 citations

Engineering, Computer Engineering, Memory +16