Statistics
Publications
19
Citations
1.8K
H-Index
15
Active since
1999
A. Shanware is an author at Texas Instruments (United States) specializing in materials science, semiconductor physics, and microelectronics.
Publications per year
1999–2008
19
19
Application of HfSiON as a gate dielectric material
M. R. Visokay, James J. Chambers, Antonio Rotondaro et al. · Applied Physics Letters · 2002 · 377 citations
Natural Sciences, Materials Engineering, Materials Science +17
Proposed universal relationship between dielectric breakdown and dielectric constant
J. W. McPherson, J. Kim, A. Shanware et al. · 2003 · 109 citations
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