Statistics
Publications
33
Citations
2.4K
H-Index
24
Active since
1992
M. R. Visokay is an author at Texas Instruments (United States) specializing in materials science, materials engineering, and thin films.
Publications per year
1992–2007
33
33
Effect of nitrogen on band alignment in HfSiON gate dielectrics
Şafak Sayan, Nhan V. Nguyen, James R. Ehrstein et al. · Applied Physics Letters · 2005 · 456 citations
Application of HfSiON as a gate dielectric material
M. R. Visokay, James J. Chambers, Antonio Rotondaro et al. · Applied Physics Letters · 2002 · 377 citations
Natural Sciences, Materials Engineering, Materials Science +17
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