Concepedia

James R. Ehrstein

JR

7

Publications

996

Citations

7

H-Index

1998

Active since

Affiliations

National Institute of Standards and Technology(Current)

Rutgers, The State University of New Jersey

James R. Ehrstein is an author at National Institute of Standards and Technology specializing in applied physics, engineering, and thin films.

Top concepts

Thin FilmsEngineeringApplied PhysicsMaterial ScienceSurface ScienceOptical MaterialsOptical PropertiesElectrical EngineeringOptoelectronic DevicesChemistry

Publications per year

1998–2005

7

Publications

7

Effect of nitrogen on band alignment in HfSiON gate dielectrics

Şafak Sayan, Nhan V. Nguyen, James R. Ehrstein et al. · Applied Physics Letters · 2005 · 456 citations

Oxide Heterostructures, Materials Science, Electrical Engineering +15

Spectroscopic ellipsometry characterization of high-<i>k</i> dielectric HfO2 thin films and the high-temperature annealing effects on their optical properties

Yong Jai Cho, N. V. Nguyen, Curt A. Richter et al. · Applied Physics Letters · 2002 · 154 citations

High Temperature Annealing, Optical Materials, Engineering +17

Critical review of the current status of thickness measurements for ultrathin SiO <sub>2</sub> on Si Part V: Results of a CCQM pilot study

M. P. Seah, Steven J. Spencer, Farid Bensebaa et al. · Surface and Interface Analysis · 2004 · 139 citations

Structural, electronic, and dielectric properties of ultrathin zirconia films on silicon

Şafak Sayan, Nhan V. Nguyen, James R. Ehrstein et al. · Applied Physics Letters · 2005 · 103 citations

Materials Science, Materials Engineering, Electrical Engineering +15

Interfacial properties of ZrO2 on silicon

Yi Lin, Ragesh Puthenkovilakam, Jane P. Chang et al. · Journal of Applied Physics · 2003 · 73 citations

Materials Science, Electrical Engineering, Dielectric Constant +12

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