Valentyn Ishchuk

Charging effect simulation model used in simulations of plasma etching of silicon

Valentyn Ishchuk, B. Volland, Maik Hauguth et al. · Journal of Applied Physics · 2012 · 48 citations

Engineering, Profile Modification, Local Surface Charge +18

Pattern-generation and pattern-transfer for single-digit nano devices

Ivo W. Rangelow, Ahmad Ahmad, Tzvetan Ivanov et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2016 · 42 citations · Full text

Engineering, Electron-beam Lithography, Pattern Transfer +20

Advanced electric-field scanning probe lithography on molecular resist using active cantilever

Marcus Kaestner, Cemal Aydogan, Tzvetan Ivanov et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2015 · 34 citations

Large area fast-AFM scanning with active “Quattro” cantilever arrays

Ahmad Ahmad, Nikolay Nıkolov, Tihomir Angelov et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2016 · 34 citations

Engineering, Lithography Capabilities, Microscopy +23

Profile simulation model for sub-50 nm cryogenic etching of silicon using SF6/O2 inductively coupled plasma

Valentyn Ishchuk, Deirdre L. Olynick, Zuwei Liu et al. · Journal of Applied Physics · 2015 · 30 citations · Full text

Vertical Anisotropic Profiles, Engineering, Integrated Circuits +20