R.S. McFadden

A 22nm high performance and low-power CMOS technology featuring fully-depleted tri-gate transistors, self-aligned contacts and high density MIM capacitors

C. Auth, C. Allen, A. Blattner et al. · 2012 · 749 citations

Low-power Cmos Technology, Engineering, Vlsi Design +19

Low-k interconnect stack with multi-layer air gap and tri-metal-insulator-metal capacitors for 14nm high volume manufacturing

K. Fischer, M. Agostinelli, C. Allen et al. · 2015 · 67 citations

Engineering, Vlsi Design, Logic Product +19

Low-k interconnect stack with metal-insulator-metal capacitors for 22nm high volume manufacturing

D. Ingerly, Ankur Agrawal, Ricardo Ascázubi et al. · 2012 · 49 citations

Engineering, Vlsi Design, Computer Architecture +19

Solar modulation in a-WO3/a-IrO2 and c-KxWO3+(x/2)/a-IrO2 complementary electrochromic windows

Stuart F. Cogan, T.D. Plante, R.S. McFadden et al. · Solar Energy Materials · 1987 · 46 citations

Engineering, Applied Physics, Solar Modulation +4

Channel Cracking Technique for Toughness Measurement of Brittle Dielectric Thin Films on Silicon Substrates

Qing Ma, Joseph Z. Xie, Sam Chao et al. · MRS Proceedings · 1998 · 19 citations

Materials Science, Engineering, Channel Cracking Technique +13