Jaakko Niinistö - Concepedia

Author

Jaakko Niinistö

Also Known As

J Niinistö, J. Niinisto, J. Niinistö, Jaakko Niinisto, Jaakko Niinistö, Jaakko Niinistö, Jaakko T. Niinistö, Niinisto, J.

Publications

2.7K

Citations

H-Index

Concepts

All Affiliations

University of Helsinki University of Tartu Helsinki Institute of Physics Eindhoven University of Technology TU Wien

About

Jaakko Niinistö is an author at University of Helsinki specializing in materials science, engineering, and surface science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	31	49	2.4K
2	Applied Physics	27	40	2K
3	Chemistry	21	26	1.2K
4	Chemical Engineering	7	7	450
5	Natural Sciences	6	6	326

Jaakko Niinistö

Publications

2.5K

Citations

H-Index

Page 1

	Year	Citations
Industrial Applications of Atomic Layer Deposition Mikko Ritala, Jaakko Niinistö ECS Transactions Materials ScienceEngineeringThin-film FabricationThin Film TechnologySurface Science	2009	138
Atomic Layer Deposition of High‐<i>k</i> Oxides of the Group 4 Metals for Memory Applications Jaakko Niinistö, Kaupo Kukli, Mikko Heikkilä, Advanced Engineering Materials EngineeringSeveral High‐k AldChemical DepositionChemical EngineeringGroup 4	2009	137
Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films Maarit Kariniemi, Jaakko Niinistö, Timo Hatanpää, Chemistry of Materials Materials ScienceThin Film PhysicsEngineeringNanotechnologyGrowth Rate	2011	118
Processing of Y<sub>2</sub>O<sub>3</sub> Thin Films by Atomic Layer Deposition from Cyclopentadienyl-Type Compounds and Water as Precursors Jaakko Niinistö, Matti Putkonen, Lauri Niinistö Chemistry of Materials Materials ScienceThin Film PhysicsY2o3 Thin FilmsCarbon Impurity LevelsThin-film Fabrication	2004	104
Atomic layer deposition and characterization of vanadium oxide thin films Timothee Blanquart, Jaakko Niinistö, Marco Gavagnin, RSC Advances Thin Film PhysicsEngineeringThin Film Process TechnologyChemistryChemical Deposition	2012	100
Atomic Layer Deposition of Ga<sub>2</sub>O<sub>3</sub> Films from a Dialkylamido-Based Precursor Charles L. Dezelah, Jaakko Niinistö, Kai Arstila, Chemistry of Materials Materials ScienceAtomic Force MicroscopyEngineeringSurface ScienceApplied Physics	2005	89
Growth and phase stabilization of HfO2 thin films by ALD using novel precursors Jaakko Niinistö, Miia Mäntymäki, Kaupo Kukli, Journal of Crystal Growth Materials ScienceMaterials EngineeringAluminium NitrideEngineeringSurface Science	2009	83
Novel mixed alkylamido-cyclopentadienyl precursors for ALD of ZrO2 thin films Jaakko Niinistö, Kaupo Kukli, Maarit Kariniemi, Journal of Materials Chemistry Materials ScienceHigh Permittivity ZirconiumIi-vi SemiconductorEngineeringGrowth Rate	2008	82
Gadolinium oxide thin films by atomic layer deposition Jaakko Niinistö, N. Petrova, Matti Putkonen, Journal of Crystal Growth Materials ScienceEngineeringOxide ElectronicsApplied PhysicsThin Films	2005	79
Surface-Controlled Deposition of Sc<sub>2</sub>O<sub>3</sub> Thin Films by Atomic Layer Epitaxy Using β-Diketonate and Organometallic Precursors Matti Putkonen, Minna Nieminen, Jaakko Niinistö, Chemistry of Materials Materials ScienceEpitaxial GrowthScandium PrecursorsThin-film FabricationOrganometallic Precursors	2001	77

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