Bart Baudemprez

EUV lithography program at IMEC

A. M. Goethals, R. Jonckheere, Gian F. Lorusso et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 28 citations

Optical Materials, Engineering, Electron-beam Lithography +16

Experimental validation of full-field extreme ultraviolet lithography flare and shadowing corrections

Alan Myers, Gian F. Lorusso, In‐Hui Kim et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2008 · 20 citations

Optical Materials, Engineering, Electron-beam Lithography +19

Imaging performance of the EUV alpha semo tool at IMEC

Gian F. Lorusso, Jan Hermans, A. M. Goethals et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 17 citations

Engineering, Electron-beam Lithography, Instrumentation Engineering +22

Process window discovery methodology development for advanced lithography

Dieter Van den Heuvel, Philippe Foubert, Bart Baudemprez et al. · 2016 · 14 citations

Engineering, Electron-beam Lithography, Industrial Engineering +20

Demonstration of scaled 0.099µm<sup>2</sup> FinFET 6T-SRAM cell using full-field EUV lithography for (Sub-)22nm node single-patterning technology

A. Veloso, S. Demuynck, Monique Ercken et al. · 2009 · 13 citations

Finfet 6T-sram, Engineering, Electron-beam Lithography +17