Concepedia

T. Furuya

TF

Statistics

Publications

5

Citations

155

H-Index

5

Active since

1974

Affiliations

Fujitsu (Japan)(Current)

T. Furuya is an author at Fujitsu (Japan) specializing in ion implantation, engineering, and electronic materials.

Publications per year

1974–1983

5

Publications

5

Electrical Activation of Implanted Arsenic in Silicon during Low Temperature Anneal

H. Nishi, Teruo Sakurai, T. Furuya · Journal of The Electrochemical Society · 1978 · 40 citations

Engineering, Materials Engineering, Materials Science +17

Migration of Mo atoms across Mo–Si interface induced by Ar+ ion bombardment

H. Nishi, T. Sakurai, T. Akamatsu et al. · Applied Physics Letters · 1974 · 32 citations

Engineering, Materials Engineering, Materials Science +15

Channeled-ion implantation of group-III and group-V ions into silicon

T. Furuya, H. Nishi, Tsuguo Inada et al. · Journal of Applied Physics · 1978 · 29 citations

Engineering, Materials Engineering, Materials Science +10

A 100 kV Maskless Ion-Implantation System with an Au–Si–Be Liquid Metal Ion Source for III-V Compound Semiconductors

Eizo Miyauchi, Hiroshi Arimoto, Hisao Hashimoto et al. · Japanese Journal of Applied Physics · 1983 · 28 citations

Engineering, Electrical Engineering, Materials Science +13

Uniform doping of channeled-ion implantation

H. Nishi, Tsuguo Inada, T. Sakurai et al. · Journal of Applied Physics · 1978 · 26 citations

Engineering, Electrical Engineering, Electronic Materials +8

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