Concepedia

H. Nishi

HN

Statistics

Publications

23

Citations

793

H-Index

16

Active since

1973

Affiliations

Fujitsu (Japan)(Current)

Fujitsu (China)

H. Nishi is an author at Fujitsu (Japan) specializing in engineering, semiconductor devices, and semiconductor materials.

Publications per year

1973–1989

23

Publications

23

A New Functional, Resonant-Tunneling Hot Electron Transistor (RHET)

Naoki Yokoyama, Kenichi Imamura, Shunichi Muto et al. · Japanese Journal of Applied Physics · 1985 · 265 citations

Engineering, Electrical Engineering, Physics +17

Tunneling Hot Electron Transistor Using GaAs/AlGaAs Heterojunctions

Naoki Yokoyama, Kenichi Imamura, Toshio Ohshima et al. · Japanese Journal of Applied Physics · 1984 · 55 citations

Engineering, Electrical Engineering, Materials Science +17

Subpicosecond base transit time observed in a hot-electron transistor (HET)

Shunichi Muto, K. Imamura, Naoki Yokoyama et al. · Electronics Letters · 1985 · 41 citations

Engineering, Electrical Engineering, Physics +17

AlN capped annealing of Si implanted semi-insulating GaAs

S. Okamura, H. Nishi, T. Inada et al. · Applied Physics Letters · 1982 · 40 citations

Engineering, Materials Engineering, Materials Science +17

Electrical Activation of Implanted Arsenic in Silicon during Low Temperature Anneal

H. Nishi, Teruo Sakurai, T. Furuya · Journal of The Electrochemical Society · 1978 · 40 citations

Engineering, Materials Engineering, Materials Science +17

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