Hiromi Hoshino

Proximity effect correction using pattern shape modification and area density map for electron-beam projection lithography

Morimi Osawa, Kimitoshi Takahashi, Masami Sato et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2001 · 45 citations

Engineering, Computer Science, Computational Electromagnetics +13

CP element based design for 14nm node EBDW high volume manufacturing

Takashi Maruyama, Yasuhide Machida, Shinji Sugatani et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 19 citations

Engineering, Computer Engineering, Manufacturing Engineering +11

EBDW technology for EB shuttle at 65nm node and beyond

Takashi Maruyama, Masaki Takakuwa, Yoshikatsu Kojima et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 18 citations

Engineering, Computer Engineering, Electrical Engineering +12

Correction for local flare effects approximated with double Gaussian profile in ArF lithography

Morimi Osawa, Teruyoshi Yao, Hajime Aoyama et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2003 · 16 citations

Medicine, Computational Design, Biomedical Optics +12

Process variation-aware three-dimensional proximity effect correction for electron beam direct writing at 45nm node and beyond

Kozo Ogino, Hiromi Hoshino, Yasuhide Machida · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2008 · 11 citations

Engineering, Electrical Engineering, Materials Science +17