G. L. Varnell

Projection reduction exposure with variable axis immersion lenses: Next generation lithography

H. C. Pfeiffer, R. S. Dhaliwal, S. D. Golladay et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 61 citations

Natural Sciences, Manufacturing Engineering, Biomedical Optics +11

E-Beam Writing Techniques for Semiconductor Device Fabrication

G. L. Varnell, D. F. Spicer, A. C. Rodger · Journal of Vacuum Science and Technology · 1973 · 30 citations

Engineering, Electrical Engineering, Manufacturing Engineering +16

Fabrication of integrated injection logic with electron-beam lithography and ion implantation

Stephen Evans, J. L. Bartelt, Betty‐Jane Sloan et al. · IEEE Transactions on Electron Devices · 1978 · 24 citations

Engineering, Computer Engineering, Electrical Engineering +15

Computer Controlled Pattern Generating System for use with Electron-Beam Writing Instruments

D. F. Spicer, A. C. Rodger, G. L. Varnell · Journal of Vacuum Science and Technology · 1973 · 13 citations

Engineering, Computer Science, Electrical Engineering +13