Roelof de Graaf

Extending immersion lithography down to 1x nm production nodes

Wim P. de Boeij, Remi Pieternella, Igor Bouchoms et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 38 citations

Engineering, Manufacturing Engineering, Systems Engineering +13

High order field-to-field corrections for imaging and overlay to achieve sub 20-nm lithography requirements

Jan Mulkens, Michael Kubis, Paul Hinnen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 23 citations

Engineering, Computer Engineering, Biomedical Imaging +10

Extending 1.35 NA immersion lithography down to 1x nm production nodes

Igor Bouchoms, Martijn Leenders, Jan Jaap Kuit et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 16 citations

Engineering, Manufacturing Engineering, Materials Science +9

NXT:1980Di immersion scanner for 7nm and 5nm production nodes

Roelof de Graaf, Stefan Weichselbaum, Richard Droste et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 13 citations

Engineering, Electrical Engineering, Manufacturing Engineering +15

0.33 NA EUV systems for high-volume manufacturing

C. J. P. P. Smeets, Guido Salmaso, Joe Carbone et al. · 2022 · 10 citations

Engineering, Electrical Engineering, Manufacturing Engineering +11