Bernd Geh

Interactions of 3D mask effects and NA in EUV lithography

Jens Timo Neumann, Paul Gräupner, Winfried Kaiser et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 32 citations

Mask effects for high-NA EUV: impact of NA, chief-ray-angle, and reduction ratio

Jens Timo Neumann, Paul Gräupner, Winfried Kaiser et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 30 citations

The impact of projection lens polarization properties on lithographic process at hyper-NA

Bernd Geh, Johannes Ruoff, Jörg Zimmermann et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 29 citations

Projection Lens Aberrations, Optical Materials, Engineering +18

Toward a comprehensive control of full-field image quality in optical photolithography

Donis G. Flagello, Jos de Klerk, Guy Davies et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1997 · 27 citations

Engineering, Electron-beam Lithography, Microscopy +24

Generation of arbitrary freeform source shapes using advanced illumination systems in high-NA immersion scanners

Jörg Zimmermann, Paul Gräupner, Jens Timo Neumann et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 25 citations

Engineering, Computer-aided Design, Biomedical Engineering +24