Investigation of the etching mechanism of silicon nitride by CF4/O2/Ar gas mixture plasma in ICP

X-ray photoelectron spectroscopy: Towards reliable binding energy referencing

Grzegorz Greczyński, Lars Hultman · Progress in Materials Science · 2019 · 2.5K citations · Full text

Natural Sciences, Chemistry, Materials Science +8

Reliable determination of chemical state in x-ray photoelectron spectroscopy based on sample-work-function referencing to adventitious carbon: Resolving the myth of apparent constant binding energy of the C 1s peak

Grzegorz Greczyński, Lars Hultman · Applied Surface Science · 2018 · 1.4K citations

Natural Sciences, Chemistry, Materials Science +12

A step-by-step guide to perform x-ray photoelectron spectroscopy

Grzegorz Greczyński, Lars Hultman · Journal of Applied Physics · 2022 · 752 citations · Full text

Natural Sciences, Chemistry, Materials Science +11

Plasma etching of Si and SiO2—The effect of oxygen additions to CF4 plasmas

C. J. Mogab, A. C. Adams, Daniel Flamm · Journal of Applied Physics · 1978 · 565 citations

Natural Sciences, Materials Science, Physics +14

Binding energy referencing in X-ray photoelectron spectroscopy: Expanded data set confirms that adventitious carbon aligns to the sample vacuum level

Grzegorz Greczyński · Applied Surface Science · 2024 · 239 citations · Full text

Natural Sciences, Chemistry, Materials Science +12