Recent progress of inorganic photoresists for next-generation EUV lithography

Yeo Kyung Kang, Sun Jin Lee, Sunghun Eom, Byeong Geun Kim, Chan-Cuk Hwang, Myung‐Gil Kim

Journal of Materials Chemistry C · 2024 · 32 citations · 76 references

Concepts

Abstract

The continuous scaling down of semiconductor devices has significantly benefited consumers by enhancing the device performance, portability, power efficiency, and affordability.

References

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