Journal of Physics D Applied Physics · 2018 · 13 citations · 47 references
EngineeringMaterials EngineeringMaterials ScienceElectronic MaterialsSemiconductor DevicesSemiconductor MaterialsDopingLight-emitting DiodesP-n JunctionsSemiconductor Device MaterialsSemiconductor NanomaterialsSemiconductor PhysicsCapacitance-voltage CharacterizationCapacitance-voltage MeasurementsCarrier InjectionCore-shell NanostructuresDoping In NanostructuresOhmic ContactsOptical CharacterizationSemiconductor Characterization
III-nitride nanostructures are of interest for a new generation of light-emitting diodes (LEDs). However, the characterization of doping incorporation in nanorod (NR) structures, which is essential for creating the p-n junction diodes, is extremely challenging. This is because the established electrical measurement techniques (such as capacitance–voltage or Hall-effect methods) require a simple sample geometry and reliable ohmic contacts, both of which are difficult to achieve in nanoscale devices. The need for homogenous, conformal n-type or p-type layers in core–shell nanostructures magnifies these challenges. Consequently, we demonstrate how a combination of non-contact methods (micro-photoluminescence, micro-Raman and cathodoluminescence), as well as electron-beam-induced-current, can be used to analyze the uniformity of magnesium incorporation in core–shell NRs and make a first estimate of doping levels by the evolution of band transitions, strain and current mapping. These techniques have been used to optimize the growth of core–shell nanostructures for electrical carrier injection, a significant milestone for their use in LEDs.
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Thermal Annealing Effects on P-Type Mg-Doped GaN Films
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