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Design and performance of 16–40GHz GaN distributed power amplifier MMICs utilizing an advanced 0.15µm GaN process
34
Citations
2
References
2016
Year
Unknown Venue
Electrical EngineeringAdvanced 0.15µMEngineeringMeasured PerformanceRf SemiconductorElectronic EngineeringCompact Transistor LayoutsAluminum Gallium NitridePower Semiconductor DeviceGan Power DeviceGan ProcessPower ElectronicsMicroelectronicsGallium NitridePower Amplifier Mmics
This paper describes the design and measured performance of 16-40GHz power amplifier MMICs fabricated with an advanced state of the art 0.15μm Gallium Nitride (GaN) process technology. The process features a 50μm thick Silicon Carbide (SiC) substrate and compact transistor layouts with individual source grounding vias (ISV). The designs utilize a non-uniform distributed power amplifier (NDPA) topology with Ruthroff connected output transformers. The 3-stage single-ended amplifier demonstrates 4.1-8.7 W of output power over a 16-40GHz bandwidth. For the second MMIC two of the single-ended amplifiers are balanced to produce 7.0-16.0 W over the same frequency range.
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