Chemistry of Materials · 2015 · 31 citations · 26 references
Materials ScienceChemical EngineeringEngineeringDonut IconNanotechnologyThermal Barrier CoatingSurface ScienceApplied PhysicsTitanium Dioxide MaterialsAltmetric Attention ScoreChemistryThin FilmsChemical DepositionChemical Vapor DepositionAtomic Layer DepositionThin Film Processing
ADVERTISEMENT RETURN TO ISSUEPREVCommunicationNEXTThermal Atomic Layer Deposition of Titanium Films Using Titanium Tetrachloride and 2-Methyl-1,4-bis(trimethylsilyl)-2,5-cyclohexadiene or 1,4-Bis(trimethylsilyl)-1,4-dihydropyrazineJoseph P. Klesko†, Christopher M. Thrush‡, and Charles H. Winter*†View Author Information† †Department of Chemistry and ‡Department of Electrical and Computer Engineering, Wayne State University, Detroit, Michigan 48202, United States*(C.H.W.) E-mail: [email protected]Cite this: Chem. Mater. 2015, 27, 14, 4918–4921Publication Date (Web):July 15, 2015Publication History Received7 May 2015Revised25 June 2015Published online16 July 2015Published inissue 28 July 2015https://pubs.acs.org/doi/10.1021/acs.chemmater.5b01707https://doi.org/10.1021/acs.chemmater.5b01707rapid-communicationACS PublicationsCopyright © 2015 American Chemical SocietyRequest reuse permissionsArticle Views3622Altmetric-Citations25LEARN ABOUT THESE METRICSArticle Views are the COUNTER-compliant sum of full text article downloads since November 2008 (both PDF and HTML) across all institutions and individuals. These metrics are regularly updated to reflect usage leading up to the last few days.Citations are the number of other articles citing this article, calculated by Crossref and updated daily. Find more information about Crossref citation counts.The Altmetric Attention Score is a quantitative measure of the attention that a research article has received online. Clicking on the donut icon will load a page at altmetric.com with additional details about the score and the social media presence for the given article. Find more information on the Altmetric Attention Score and how the score is calculated. Share Add toView InAdd Full Text with ReferenceAdd Description ExportRISCitationCitation and abstractCitation and referencesMore Options Share onFacebookTwitterWechatLinked InRedditEmail Other access optionsGet e-AlertscloseSupporting Info (2)»Supporting Information Supporting Information SUBJECTS:Atomic layer deposition,Mass spectrometry,Metals,Physical vapor deposition,Titanium Get e-Alerts
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Handbook of X-Ray Photoelectron Spectroscopy
J. F. Moulder · Medical Entomology and Zoology · 1995 · 23.7K citations
Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges
Harald B. Profijt, Stephen E. Potts, M. C. M. van de Sanden et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2011 · 864 citations · Full text
Materials Science, Materials Engineering, Chemical Engineering +13