Self-Heating in GaN Transistors Designed for High-Power Operation

Abstract

DC and transient self-heating effects are investigated in normally off AlGaN/GaN transistors designed for a high-power operation. Electrical and optical methods are combined with thermal simulations; 2- <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\mu $ </tex-math></inline-formula> s-long voltage pulses dissipating about 4.5 W/mm are applied on four different transistor structures combining GaN or AlGaN buffer on an n-type SiC substrate with or without Ar implantation. Transistors with only 5% Al mass fraction in the buffer show almost a threefold increase in the transient self-heating if compared with devices on the GaN buffer. On the other hand, 2- <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\mu $ </tex-math></inline-formula> s-long pulses were found not to be long enough for the Ar-implanted SiC substrate to influence the device self-heating unless AlGaN composition changes. In the dc mode, however, both the buffer composition and Ar implantation significantly influence the self-heating effect with the highest temperature rise for the transistor having the AlGaN buffer grown on the Ar-implanted SiC. We point on possible tradeoffs between the transistor high-power design and the device thermal resistance.