Japanese Journal of Applied Physics · 1994 · 30 citations · 31 references
Natural SciencesChemistryMaterials ScienceSurface ChemistrySurface EngineeringSurface ScienceCleanroom ProcessingLaser Material ProcessingLaser PhysicsLaser Surface ProcessingSurface CleaningSurface ModificationDry CleaningLaser AblationLaser Irradiation ParametersLaser Surface CleaningLaser Surface ModificationLaser Surface TreatmentLaser Surface Treatment MechanismsUltrasonic Cleaning
Surface contaminations are removed by laser irradiation with pulse output and short wavelength. It is a new dry cleaning process to remove surface organic contaminations without using ultrasonic cleaning with carbon fluorochloride (CFC) and other organic solvents. This provides a new dry process to clean different substrate surfaces and can take the place of conventional wet cleaning processes such as ultrasonic cleaning with CFC and other organic solvents. The mechanisms of laser cleaning may include laser photodecomposition, laser ablation and surface vibration due to the impact of laser pulse.
31
Laser-cleaning techniques for removal of surface particulates
A. C. Tam, W. P. Leung, Werner Zapka et al. · Journal of Applied Physics · 1992 · 413 citations
B. Anthony, L. Breaux, Tsan‐sheng Hsu et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1989 · 128 citations
Natural Sciences, Materials Engineering, Materials Science +17