Submicrometer linewidth metrology in the optical microscope

Diana Nyyssonen, Robert D. Larrabee

Journal of Research of the National Bureau of Standards · 1987 · 66 citations · 12 references

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Concepts

Abstract

in accuracy as well as in precision to meet the anticipated needs of the integrated circuit (IC) industry for submicrometer dimensional metrology. This paper discusses the effects of inadequate precision and accuracy on process control in Ie fabrication and suggests some ways of circumventing these limitations until better instrumentation and standards become available.

References

12