IEEE Electron Device Letters · 2007 · 39 citations · 13 references
EngineeringElectrical EngineeringMaterials ScienceOptoelectronicsSemiconductor DevicesSemiconductor MaterialsCarrier TransportLight-emitting DiodesOptoelectronic DevicesQuantum ConfinementSemiconductor Device MaterialsSemiconductor PhysicsCarrier ConfinementCarrier InjectionCarrier Recombination DynamicsExternal Quantum EfficiencyInternal Quantum EfficiencyLight-emitting DevicesNonradiative RecombinationQuantum Efficiency
Contemporary silicon light-emitting diodes in silicon-on-insulator (SOI) technology suffer from poor efficiency compared to their bulk-silicon counterparts. In this letter, we present a new device structure where the carrier injection takes place through silicon slabs of only a few nanometer thick. Its external quantum efficiency of 1.4 • 10−4 at room temperature, with a spectrum peaking at 1130 nm, is almost two orders higher than reported thus far on SOI. The structure diminishes the dominant role of nonradiative recombination at the n+ and p+contacts, by confining the injected carriers in an SOI peninsula. With this approach, a compact infrared light source can be fabricated using standard semiconductor processing steps.
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An efficient room-temperature silicon-based light-emitting diode
Wai Lek Ng, M. A. Lourenço, R. Gwilliam et al. · Nature · 2001 · 640 citations
Efficient silicon light-emitting diodes
Martin A. Green, Jianhua Zhao, Aihua Wang et al. · Nature · 2001 · 542 citations
D.K. Schroder · IEEE Transactions on Electron Devices · 1997 · 439 citations
Self-limiting oxidation for fabricating sub-5 nm silicon nanowires
H. I. Liu, D. K. Biegelsen, F. A. Ponce et al. · Applied Physics Letters · 1994 · 287 citations