Intrinsic Defects in Cubic Silicon Carbide

Abstract

Irradiation of fast particles like 1 MeV electrons and 2 MeV protons was made for single crystalline cubic silicon carbide (3C-SiC) grown epitaxially on Si by chemical vapor deposition in order to introduce point defects in the material. Intrinsic point defects in 3C-SiC have been characterized by electron spin resonance (ESR), positron annihilation spectroscopy (PAS), Hall and photoluminescence (PL) techniques. The structure and annealing behavior of intrinsic defects, e.g. monovacancies at silicon and carbon sublattice sites, are described based on the results obtained by ESR and PAS. The contributions of such point defects to electrical and optical properties of 3C-SiC are discussed using the Hall and PL results, with a brief review of published work.