Concepedia

Time-resolved cavity ring-down spectroscopic study of the gas phase and surface loss rates of Si and SiH3 plasma radicals

J.P.M. Hoefnagels, A. A. E. Stevens, M. G. H. Boogaarts, W.M.M. Kessels, M. C. M. van de Sanden

Chemical Physics Letters · 2002 · 34 citations · 14 references

DOI

Concepts

References

14

A simple formula for diffusion calculations involving wall reflection and low density

P. J. Chantry · Journal of Applied Physics · 1987 · 365 citations

, , +16

Cross‐Sections, Rate Constants and Transport Coefficients in Silane Plasma Chemistry

J. Perrin, O. Leroy, Marie‐Claude Bordage · Contributions to Plasma Physics · 1996 · 350 citations

, , +17

Surface reaction probabilities and kinetics of H, SiH3, Si2H5, CH3, and C2H5 during deposition of a-Si:H and a-C:H from H2, SiH4, and CH4 discharges

J. Perrin, Masaharu Shiratani, Patrick Kae-Nune et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1998 · 231 citations

, , +17

Mass spectrometry detection of radicals in SiH<sub>4</sub>-CH<sub>4</sub>-H<sub>2</sub>glow discharge plasmas

Patrick Kae-Nune, J. Perrin, Jean Guillon et al. · Plasma Sources Science and Technology · 1995 · 104 citations

, , +13

Hydrogenated amorphous silicon deposited at very high growth rates by an expanding Ar–H2–SiH4 plasma

W. M. M. Kessels, R. J. Severens, Arno H. M. Smets et al. · Journal of Applied Physics · 2001 · 100 citations · Full text

, , +17