Physical Review Letters · 2006 · 209 citations · 14 references
Materials ScienceMath XmlnsElectrical EngineeringElectrical ContactEngineeringIi-vi SemiconductorNanoelectronicsSuccessful P-type DopingApplied PhysicsSemiconductor MaterialThin FilmsMicroelectronicsApplied AlgebraOptoelectronicsCategoryiii-v SemiconductorCompound SemiconductorP-type Bulk Region
The first evidence of successful p-type doping of InN is presented. It is shown that InN:Mg films consist of a p-type bulk region with a thin n-type inversion layer at the surface that prevents electrical contact to the bulk. Capacitance-voltage measurements indicate a net concentration of ionized acceptors below the -type surface. Irradiation with 2 MeV He+ ions is used to convert the bulk of InN:Mg from p to n-type, at which point photoluminescence is recovered. The conversion is well explained by a model assuming two parallel conducting layers (the surface and the bulk) in the films.
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Unusual properties of the fundamental band gap of InN
Junqiao Wu, W. Walukiewicz, K. M. Yu et al. · Applied Physics Letters · 2002 · 1.5K citations · Full text
Materials Science, Ii-vi Semiconductor, Wurtzite-structured Inn Grown +15
Intrinsic Electron Accumulation at Clean InN Surfaces
Imran Mahboob, T. D. Veal, C. F. McConville et al. · Physical Review Letters · 2004 · 485 citations
Surface Fermi Level, Surface Characterization, Electrical Engineering +13