IEEE Transactions on Electron Devices · 1980 · 54 citations · 8 references
EngineeringManufacturing EngineeringAdditive ManufacturingMicrofabricationOpticsOptical AberrationsOptical ImagingOptical PrintingPhysical OpticsPupil OpticsCoherent ImagingDefocus ProfilesDiffraction-limited ImagingDiffraction-limited PerformanceDiffraction-limited ResolutionLens DesignOptical Imaging TheoryPrinting Technologies
Optical projection printing is quantitatively studied, using the diffracted image of two bars of equal width and space and an aspect ratio of three. Hopkins' four-dimensional integral for partially coherent imaging is used for the numerical analysis. Diffraction-limited lenses with a circular pupil are used. Constant intensity profiles in an absorptionless photoresist and nonreflective substrate are evaluated. Then the tolerances ot defocus and intensity are derived using a linewidth tolerance of ±2.5 percent of the mask linewidth which varies from 0.5, 0.75, 1, 1.5, 2, to 2.5 µm. The illuminations used have σ = 0, 0.5, 0.7, 0.78, 1, 1.3, and infinity.
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Characterization of positive photoresist
F.H. Dill, W.P. Hornberger, P.S. Hauge et al. · IEEE Transactions on Electron Devices · 1975 · 422 citations
Natural Sciences, Materials Engineering, Optical Materials +9
Burn J. Lin · Journal of Vacuum Science and Technology · 1975 · 159 citations