Publication | Closed Access
Reduction of photoresist standing-wave effects by post-exposure bake
61
Citations
2
References
1975
Year
Post-exposure BakeOptical MaterialsEngineeringWave OpticOptical PropertiesOptical TestingApplied PhysicsOptical Information ProcessingInstrumentationOptical EngineeringPositive Photoresist FilmsOptoelectronicsPhotoelasticityResidual Effects
A process is described for reducing the residual effects of standing waves upon exposed and developed lines in positive photoresist films.
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