SiO2 single layer for reduction of the standing wave effects in the interference lithography of deep photoresist structures on Si

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<i>Optical Properties of Thin Solid Films</i>

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Optically matched trilevel resist process for nanostructure fabrication

Mark L. Schattenburg, Richard Aucoin, Robert C. Fleming · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1995 · 85 citations

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