Highly scalable on-axis confined cell structure for high density PRAM beyond 256Mb

Abstract

We firstly fabricated on-axis confined structure and evaluated based on 64Mb PRAM with 0.12/spl mu/m-CMOS technologies. Ge/sub 2/Sb/sub 2/Te /sub 5/ was confined within small pore, which resulted in low writing current of 0.4mA. The pore is on-axis with upper and lower contacts, which leads to good scalability of PRAM above 256Mb. The confined structure was relatively insensitive to small cell edge damage effect. The on-axis confined structure is a promising candidate for high density PRAM due to low writing current, good scalability, and insensitiveness to edge damage.