Effect of deposition condition on residual stress of iron nitride thin films prepared by magnetron sputtering and ion implantation

Magnetic nitrides

J. M. D. Coey, Paul A. Smith · Journal of Magnetism and Magnetic Materials · 1999 · 300 citations

The influence of discharge current on the intrinsic stress in Mo films deposited using cylindrical and planar magnetron sputtering sources

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Natural Sciences, Materials Science, Physics +17

Effect of sputtering gas pressure and nitrogen concentration on crystal orientation and residual stress in sputtered AlN films

Kazuya Kusaka, Daisuke Taniguchi, T. Hanabusa et al. · Vacuum · 2002 · 51 citations

Natural Sciences, Materials Engineering, Materials Science +17

Study of iron nitride thin films deposited by pulsed laser deposition

Mukul Gupta, Ajay Gupta, P. Bhattacharya et al. · Journal of Alloys and Compounds · 2001 · 51 citations

Natural Sciences, Materials Science, Physics +14

Internal interfaces and intrinsic stress in thin amorphous Cu-Ti and Co-Tb films

U. Geyer, U. von Hülsen, Hartmut Köpf · Journal of Applied Physics · 1998 · 41 citations

Natural Sciences, Materials Engineering, Materials Science +16