Publication | Closed Access
Characterization of orientation-dependent etching properties of single-crystal silicon: effects of KOH concentration
316
Citations
6
References
1998
Year
Materials ScienceMaterials EngineeringWafer Scale ProcessingEngineeringSingle-crystal SiliconMicrofabricationSurface ScienceApplied PhysicsKoh ConcentrationSemiconductor Device FabricationSilicon On InsulatorMicroelectronicsPlasma EtchingNanolithography Method
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