Japanese Journal of Applied Physics · 1988 · 17 citations · 15 references
Natural SciencesMaterials EngineeringMaterials ScienceMaterials ChemistryPhysical ChemistrySolid-state ChemistryAdsorption At InterfacesEpitaxial GrowthSurface AdsorptionAtomic Layer EpitaxyCompetitive AdsorptionCompetitive Adsorption KineticsEpitaxial Growth KineticsLangmuir Adsorption Model
The growth of In 1- x Ga x As by halogen transport atomic layer epitaxy (ALE) is described. The vapor-solid distribution relation for the group III elements is experimentally obtained. A model which assumes the Langmuir-type adsorption for the group III monochlorides is developed. It is shown that the solid composition grown by halogen transport ALE is determined by the competitive adsorption of GaCl and InCl on the substrate.
15
Gallium Arsenide and Related Compounds
Bob Wilson · Physics Bulletin · 1973 · 694 citations
Natural Sciences, Chemistry, Physics +10
Atomic layer epitaxy of III-V binary compounds
S. M. Bedair, M. A. Tischler, T. Katsuyama et al. · Applied Physics Letters · 1985 · 146 citations