Nanotechnology · 2007 · 22 citations · 18 references
Natural SciencesMaterials EngineeringMaterials ScienceNanotechnologyPolymer ChemistryPolymer MaterialsNanoimprint LithographyPolymer CharacterizationPolymer ProcessingPolymer Thin FilmsSoft LithographyThin Film LithographyFlexible SubstratesNanoimprint Resist MaterialsPatterning Of Polymer Thin FilmsResidual LayerShrinkageThermal Nanoimprint LithographyThermal PolymerizationViscosity
A novel liquid thermal polymerization resist was prepared for nanoimprint lithography on flexible plastic substrates. The resist is a mixture of poly(methyl methacrylate) (PMMA), methylmethacrylate (MMA), n-butylacrylate (n-BA), methacrylic acid (MAA) and 2,2'-azobisisobutyronitrile (AIBN). The resist can be imprinted at room temperature with a pressure of 1.2 MPa, and then cured at 95 °C to obtain nano-scaled and micro-scaled patterns. Replications of high-density line and space patterns with resolutions of 50 and 100 nm were obtained on a flexible ITO/PET substrate. The liquid resist has low viscosity, and shows a near-zero residual layer at the bottom of the pattern. Due to the addition of PMMA as the binder, the shrinkage of the resist after curing is only 2.01%.
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