Applied Physics Letters · 2006 · 10 citations · 9 references
EngineeringMaterials EngineeringMaterials ScienceElectronic MaterialsSemiconductor DevicesSurface ScienceDefects In Electronic MaterialsDevice CharacterizationSemiconductor DefectsSemiconductor Device MaterialsSemiconductor SurfacesStacking FaultsDislocation PropagationDislocationsForward Bias CharacteristicsPin DiodesPrimary NucleationStacking Fault FormationStacking Faults In SemiconductorsSurface Damage
The propagation of stacking faults (SF) in SiC PiN diodes under forward bias was studied by the electron beam induced current mode of scanning electron microscopy. The primary SF nucleation sites were confirmed to be pre-existing basal plane dislocations (BPD). Damage to the diode surface can also cause SF propagation in the device. Hence, in addition to the elimination of BPDs in the active layer of the diode, avoidance of surface damage by paying careful attention to device processing and testing is also important for fabricating stable SiC PiN diodes.
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Charge collection scanning electron microscopy
H. J. Leamy · Journal of Applied Physics · 1982 · 776 citations