Journal of Physics D Applied Physics · 1999 · 135 citations · 24 references
EngineeringMaterials EngineeringMaterials ScienceMaterials CharacterizationMaterials ChemistrySemiconductor MaterialsIii-v SemiconductorsSemiconductor HeterostructuresSemiconductor PhysicsStrain AnalysisWide-bandgap SemiconductorsX-ray DiffractionEpitaxial StrainGallium Nitride (Gan) MaterialsHeteroepitaxyHeterostructure MaterialsHeterostructuresLattice ParametersStrain EffectsX-ray Diffraction Analysis
An evaluation algorithm for the determination of the chemical composition of strained hexagonal epitaxial films is presented. This algorithm is able to separate the influence of strain and composition on the lattice parameters measured by x-ray diffraction. The measurement of symmetric and asymmetric reflections delivers the strained lattice parameters a and c of hexagonal epitaxial films. These lattice parameters are used to calculate the relaxed lattice parameters employing the theory of elasticity. From the relaxed parameters, the chemical composition of the epitaxial film can be determined by Vegard's rule. The algorithm has been applied to InGaN/GaN/Al2O3(00.1) heterostructures.
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