Publication | Closed Access
Determination of the chemical composition of distorted InGaN/GaN heterostructures from x-ray diffraction data
134
Citations
24
References
1999
Year
Wide-bandgap SemiconductorEngineeringChemical CompositionMechanical EngineeringChemistryMolecular Beam EpitaxyEpitaxial GrowthMaterials ScienceMaterials EngineeringDistorted Ingan/gan HeterostructuresX-ray Diffraction DataAluminum Gallium NitrideGallium OxideCategoryiii-v SemiconductorX-ray DiffractionApplied PhysicsGan Power DeviceMultilayer HeterostructuresEvaluation AlgorithmOptoelectronics
An evaluation algorithm for the determination of the chemical composition of strained hexagonal epitaxial films is presented. This algorithm is able to separate the influence of strain and composition on the lattice parameters measured by x-ray diffraction. The measurement of symmetric and asymmetric reflections delivers the strained lattice parameters a and c of hexagonal epitaxial films. These lattice parameters are used to calculate the relaxed lattice parameters employing the theory of elasticity. From the relaxed parameters, the chemical composition of the epitaxial film can be determined by Vegard's rule. The algorithm has been applied to InGaN/GaN/Al2O3(00.1) heterostructures.
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