Concepedia

Publication | Closed Access

Enhancement of ALCVD™ TiN growth on Si–O–C and α-SiC:H films by O2-based plasma treatments

DOI

27

Citations

4

References

2002

Year

A. Satta, Mikhaı̈l R. Baklanov, A. Vantomme, H. Bender, Thierry Conard, Karen Maex, W.-M. Li, Kai‐Erik Elers, Suvi Haukka
Microelectronic Engineering

References

YearCitations

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