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Metal-Organic Vapor-Phase Epitaxial Growth and Characterization of Quaternary AlGaInN
35
Citations
22
References
2000
Year
Materials ScienceMaterials EngineeringConstant-pl Peak EnergyPhotoluminescenceEngineeringEpitaxial GrowthCompound SemiconductorSurface ScienceApplied PhysicsQuantum MaterialsOptoelectronic MaterialsAluminum Gallium NitrideOptoelectronic DevicesMolecular Beam EpitaxyCategoryiii-v SemiconductorOptoelectronicsQuaternary CompositionsQuaternary Algainn
We report the growth and characterization of quaternary AlGaInN. A combination of photoluminescence (PL), high-resolution X-ray diffraction (XRD), and Rutherford backscattering spectrometry (RBS) characterizations enables us to explore the contours of constant-PL peak energy and lattice parameter as functions of the quaternary compositions. The observation of room temperature PL emission at 351 nm (with 20%Al and 5%In) renders initial evidence that the quaternary could be used to provide confinement for GaInN (and possibly GaN). AlGaInN/GaInN multiple quantum wells (MQWs) heterostructures have been grown; both XRD and PL measurement suggest the possibility of incorporating this quaternary into optoelectronic devices.
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