Concepedia

Effects of post-oxidation annealing temperature on ZrO2 thin film deposited on 4H-SiC substrate

Tedi Kurniawan, Yew Hoong Wong, Kuan Yew Cheong, Jeong Hyun Moon, Wook Bahng, Khairunisak Abdul Razak, Zainovia Lockman, Hyeong Joon Kim, Nam‐Kyun Kim

Materials Science in Semiconductor Processing · 2011 · 36 citations · 19 references

DOI

Concepts

References

19

High-κ gate dielectrics: Current status and materials properties considerations

G. D. Wilk, Robert M. Wallace, J. Anthony · Journal of Applied Physics · 2001 · 5.9K citations

, , +17

Insulator investigation on SiC for improved reliability

Lori A. Lipkin, John W. Palmour · IEEE Transactions on Electron Devices · 1999 · 221 citations

, , +17

Synthesis of ZrO2 thin films by atomic layer deposition: growth kinetics, structural and electrical properties

M. Cassir, Fabrice Goubin, Cécile Bernay et al. · Applied Surface Science · 2002 · 123 citations

, , +16

A novel thermally-stable zirconium amidinate ALD precursor for ZrO2 thin films

Byoung Guan Lee, Kyu Jeong Choi, A. Hande et al. · Microelectronic Engineering · 2008 · 91 citations

, , +6

Effects of Postdeposition Annealing in Argon Ambient on Metallorganic Decomposed CeO[sub 2] Gate Spin Coated on Silicon

Hock Jin Quah, Kuan Yew Cheong, Z. Hassan et al. · Journal of The Electrochemical Society · 2009 · 69 citations

, , +17