Concepedia

Techniques for the sputtering of optimum indium-tin oxide films on to room-temperature substrates

N. Danson, I. Safi, GW Hall, R.P. Howson

Surface and Coatings Technology · 1998 · 38 citations · 13 references

DOI

Concepts

References

13

The Hall effect in polycrystalline and powdered semiconductors

John Orton, M. J. Powell · Reports on Progress in Physics · 1980 · 587 citations

, , +17

Charged particle fluxes from planar magnetron sputtering sources

B. Window, N. Savvides · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1986 · 419 citations

, , +13

Reactive high rate D.C. sputtering: Deposition rate, stoichiometry and features of TiOx and TiNx films with respect to the target mode

S. Schiller, G. Beister, William K. Sieber · Thin Solid Films · 1984 · 145 citations

, , +17

The formation and control of direct current magnetron discharges for the high-rate reactive processing of thin films

R.P. Howson, A.G. Spencer, K. Oka et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1989 · 80 citations

, , +17

Plasma ion-assisted deposition: A promising technique for optical coatings

S. Pongratz, A. Zöller · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1992 · 79 citations

, , +17