Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1991 · 10 citations · 0 references
Natural SciencesMaterials SciencePhysicsElectronic MaterialsOpticsSemiconductor DevicesElectron Beam LithographyElectron Beam PhysicsScattering ProblemsScattering TheoryBackscattering EffectsCritical Dimension ControlElectron Beam FocusingElectron Beam Irradiation EffectsElectron Beam OpticsElectron Beam Scattering Theory
The multiple electron beam scattering effect is studied experimentally in an electron optical column. This effect causes a serious problem on the critical dimension of LSI pattern when the whole area of a wafer is exposed to an electron beam. This paper discusses the quantitative analysis and a method of reducing this effect.