Applied Physics Letters · 1968 · 49 citations · 6 references
EngineeringMaterials EngineeringMaterials ScienceElectronic MaterialsSemiconductor DevicesSemiconductor MaterialsCarrier TransportDopingIon ImplantationP-n JunctionsSemiconductor Device MaterialsWide Band Gap SemiconductorsForward Bias CharacteristicsIon Implantation EffectsJunction FabricationP-n Junction CharacteristicsP-type DopingSemiconductor Junctions
Type conversion and p-n junctions have been produced by the implantation of 400-keV As+ ions into n-CdTe. In forward bias, the junctions emit bandgap infrared radiation at room temperature.
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R. S. Title, G. Mandel, F. F. Morehead · Physical Review · 1964 · 120 citations
Natural Sciences, Materials Science, Condensed Matter Physics +13
Zn and Te Implantations into GaAs
J. W. Mayer, O. J. Marsh, R.G. Mankarious et al. · Journal of Applied Physics · 1967 · 38 citations