Junction Fabrication

Junction Fabrication is the semiconductor manufacturing process by which a p-n junction is created through the controlled doping of adjacent p-type and n-type regions within a single crystal lattice, distinguished from other fabrication techniques by its precise formation of a metallurgical junction essential for diode and transistor functionality.

393

Publications

15.9K

Citations

1.8K

Authors

434

Institutions

Publications per year

2017–2026

56

Authors

1.8K

  1. NC
    N.W. Cheung

    University of California, Berkeley, United States

    4 publications · 128 citations

    4

    h-index

  2. AJ
    A. J. Steckl

    University of Cincinnati, United States

    4 publications · 50 citations

    4

    h-index

  3. MC
    Michael Current

    Applied Materials (United States), United States

    4 publications · 94 citations

    4

    h-index

  4. AU
    A. Ulyashin

    University of Oslo, Norway

    3 publications · 71 citations

    3

    h-index

  5. WH
    Weida Hu

    Shanghai Institute of Technical Physics, China

    3 publications · 275 citations

    3

    h-index

1–5 of 1.8K

Venues

  1. Applied Physics Letters

    50 publications · 2.8K citations

    30

    h-index

  2. Journal of Applied Physics

    23 publications · 661 citations

    15

    h-index

  3. IEEE Transactions on Electron Devices

    16 publications · 557 citations

    14

    h-index

  4. IEEE Electron Device Letters

    16 publications · 387 citations

    14

    h-index

  5. IEEE Transactions on Applied Superconductivity

    17 publications · 584 citations

    13

    h-index

1–5