Concepedia

Mechanism of high density plasma processes for ion-driven etching of materials

J.W. Lee, John F. Donohue, Kenneth D. Mackenzie, Russ Westerman, D. J. Johnson, S. J. Pearton

Solid-State Electronics · 1999 · 14 citations · 11 references

DOI

Concepts

References

11

Review of inductively coupled plasmas for plasma processing

Jeffrey Hopwood · Plasma Sources Science and Technology · 1992 · 678 citations

, , +17

Surface science aspects of etching reactions

Harold F. Winters, J. W. Coburn · Surface Science Reports · 1992 · 496 citations

, , +12

Experiments on helicon plasma sources

Francis F. Chen · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1992 · 253 citations

, , +17

The application of the helicon source to plasma processing

Andrew Perry, D. Vender, Rod Boswell · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1991 · 245 citations

, , +16

Surface processes in low pressure plasmas

G. S. Oehrlein · Surface Science · 1997 · 66 citations

, , +12