Formation and Surface Modification of Nanopatterned Thiol‐ene Substrates using Step and Flash Imprint Lithography

Abstract

Functionalized, thiol-ene nanopatterned materials are fabricated using step and flash imprint lithography (SFIL) and are readily modified with a micropatterned, secondary polymer layer through the unreacted pendant thiols on the surface. Thiol-enes offer versatile chemistry, rapid curing and excellent control over polymer properties using stoichiometry and functionality for both base substrate and attached secondary polymer layer. Supporting information for this article is available on the WWW under http://www.wiley-vch.de/contents/jc_2089/2008/adma200800672_s.pdf or from the author. Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.